film synthesis
characterization
ceramic processing
metallization
This small utility chamber is used for general metallization or other non-critical coating applications. RF and dc plasma drives service this two-magnetron, non-load locked sputter tool.
![Screen Shot 2020-10-31 at 11.50.46 AM](https://sites.psu.edu/mariagroupalpha/files/2020/10/Screen-Shot-2020-10-31-at-11.50.46-AM.png)
Principal instrument users include Sarah Lowum, Nate McIlwaine, and Kevin Ferri.