CdO-II

CdO-II

CdO plasmonics 2 is a High Power Impulse Magnetron Sputtering instrument. It enables one to achieve plasma power densities greater than 1 kW/cm2 under pulsed conditions with a duty cycle (or percent on time) of about 10%. With such high powers one achieves ionization fractions greater than 50% of both gas-phase and metallic species. This instrument is dedicated to making intrinsic and doped CdO for the purpose of epsilon near zero structures that can either absorb or emit a specific radiation energy depending on the dopant level engineered into the thin layers, and a variety of other layers and multilayers engineered to sustain a particular mode including surface plasmon polaritons, coupled hybrid polaritons, and hyperbolic modes.