oxide HiPIMS explorer

In 2014 our group began to use high power impulse magnetron sputtering (HiPIMS) for transparent conducting oxides and immediately appreciated the expanded ability to control plasma energetics and chemistry as compared to RF and dc plasma drives. In 2020, inspired by our work on CdO, we initiated a research activity to explore a broad assessment of HiPIMS sputtering of complex oxides. Ultimately, we wish to explore the extent to which HiPIMS can be used in reactive mode to make oxide films from metallic targets without excessive poisoning. The high ionization fraction in a HiPIMS plasma should offer interesting plasma chemistries that are substantially more reactive that may be able to access non-equilibrium chemical potentials that drive defect chemistries into new and interesting spaces. The new chamber is currently in the design stage, keep an eye out for updates on the construction process…

images coming soon…