JPM group

JPM group

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UV-ozone

film synthesis

  •           CdO-II
  • thermite 3.0
  • laser ablation 4.0
  • laser ablation 1.0
  • FEEver – nitride
  • FEEver – oxide
  • e-beam evaporator
  • nitride HiPIMS explorer
  • oxide HiPIMS explorer
  • carbide|boride|nitride
  • metallization
  • UV-ozone

characterization

  • x-ray diffraction
  • x-ray fluorescence
  • ellipsometry: IR
  • ellipsometry: VIS
  • atomic force microscopy
  • electrical testing
  • calorimetry

ceramic processing

  • mixing and milling
  • pellet pressing
  • the sinterometer
  • The Ceramic Factory
UV-ozone cleaner

Several minutes of ozone exposure produced by UV illumination in air is a standard cleaning procedure for substrate prior to loading into our deposition systems.

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